发明名称 |
METHOD FOR MANUFACTURING GRAY TONE MASK AND GRAY TONE MASK |
摘要 |
<p>PURPOSE: A method for manufacturing a gray tone mask and a gray tone mask are provided to manufacture high quality of TFT by forming a pattern between a source and a drain channel section to be high precision. CONSTITUTION: A semi transmissive film(22) is formed on a transparent substrate(21). A light shielding layer(23) is formed on the semi transmissive film. A resist film(24) is formed on the light shielding layer. A resist pattern(24a), which corresponds to the light shielding unit on a mask blank, is formed. The light shielding layer is exposed using the resist pattern as a mask and is etched.</p> |
申请公布号 |
KR20110122654(A) |
申请公布日期 |
2011.11.10 |
申请号 |
KR20110097940 |
申请日期 |
2011.09.28 |
申请人 |
HOYA CORPORATION |
发明人 |
IMURA KAZUHISA;SANO MICHIAKI |
分类号 |
G02F1/13;H01L21/027;G02F1/1368;G03F1/54;G03F1/70;G03F7/20;H01L21/00;H01L21/336;H01L29/786 |
主分类号 |
G02F1/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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