| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a vacuum processing apparatus capable of both reduction of foreign particles in a vacuum chamber in which a vacuum atmosphere and an air atmosphere are switched, and increasing of a throughput. <P>SOLUTION: A vacuum processing apparatus includes plural process devices; a vacuum transport chamber for transporting a sample to each of the process devices; a vacuum transport robot that is provided in the vacuum transport chamber and that performs sample transport; an air transport chamber that is provided with a cassette accommodating plural samples for transporting the samples accommodated in the cassette in the air; an air transport robot that is provided in the air transport chamber and that performs sample transport; and a lock chamber provided between the vacuum transport chamber and the air transport chamber. A chamber included in the vacuum processing apparatus includes a gas supplying path 209 for supplying dry gas via a venting valve 207, and a humidity sensor 211 for detecting a humidity of the lock chamber. In the chamber, at the time of evacuation, the venting valve 207 is opened so that the humidity reaches a predetermined value or less to supply the dry gas, whereby fine liquid particles are prevented from being generated. <P>COPYRIGHT: (C)2012,JPO&INPIT |
