DETERMINATION OF MATERIAL OPTICAL PROPERTIES FOR OPTICAL METROLOGY OF STRUCTURES
摘要
Methods of determining a material optical property for optical metrology of a structure is described. One method includes simulating a set of diffraction orders for a grating structure based on two or more azimuth angles and on one or more angles of incidence. A simulated spectrum is provided based on the set of diffraction orders. Another method includes simulating a set of diffraction orders for a grating structure based on two or more angles of incidence. A simulated spectrum is provided based on the set of diffraction orders.
申请公布号
WO2011139982(A2)
申请公布日期
2011.11.10
申请号
WO2011US34833
申请日期
2011.05.02
申请人
KLA-TENCOR CORPORATION;TOKYO ELECTRON LIMITED;MADSEN, JONATHAN, MICHAEL;YANG, WEIDONG