发明名称 |
PROCESS GAS CONFINEMENT FOR NANOIMPRINTING LITHOGRAPHY |
摘要 |
Gas confinement systems and methods are described. In particular, systems and methods are described that include a barrier that confines purging gas and restricts flow of purging gas to other elements within a nano-lithography system. The barrier can be adjusted to accommodate and/or control desired pressure variations between working and external environments. |
申请公布号 |
WO2011100050(A3) |
申请公布日期 |
2011.11.10 |
申请号 |
WO2011US00227 |
申请日期 |
2011.02.08 |
申请人 |
MOLECULAR IMPRINTS, INC. |
发明人 |
JAIN, ANKUR;SHACKLETON, STEVEN, C.;CHOI, BYUNG-JIN |
分类号 |
G03F7/00 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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