| 发明名称 |
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition suitable for a liquid immersion exposure process in a resist pattern formation and for image development using an organic solvent. <P>SOLUTION: A radiation-sensitive resin composition used in a resist pattern formation method in which image development is performed using an organic solvent (X) contains a polymer (A), a radiation-sensitive acid generator (B) and a solvent (C). The polymer (A) contains a specific acrylic-group repeating unit which has a lactone structure or a carbonate structure in a side chain. <P>COPYRIGHT: (C)2012,JPO&INPIT |
| 申请公布号 |
JP2011227463(A) |
申请公布日期 |
2011.11.10 |
| 申请号 |
JP20110043032 |
申请日期 |
2011.02.28 |
| 申请人 |
JSR CORP |
发明人 |
WAKAMATSU TAKASHI;INABA JUNICHIRO |
| 分类号 |
G03F7/038;C08F20/28;G03F7/039;G03F7/32;H01L21/027 |
主分类号 |
G03F7/038 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
