RESIN COMPOSITION, INSULATING FILM USING THE SAME, AND ELECTRONIC COMPONENT

摘要

Provided is a photosensitive resin composition having excellence in photosensitive characteristics such as resolution and residual film ratio, in adhesion with the substrate the region exposed to a lower amount of light, in light resistance to UV light region, and in light transmittance at visible light region, and a photosensitive resin composition for an organic interlayer insulating film for a TFT-LCD requiring an etching process margin, an exposing process margin, and a light resistance.