METHOD OF PRODUCING SILICON CHANNEL MATRIX

摘要

FIELD: machine building. ^ SUBSTANCE: proposed method comprises anode etching of single-crystal p-type silicon with seed holes on surface in solution of electrolytes containing ions of hydrogen and fluorine, stopping opened micro channels by plugs of silicon dioxide nanoparticles to perform low-temperature deposition of porous-silicon film on matrix continuous surface and produce channels from pores of said silicon in entire nanometre range. ^ EFFECT: decreased transverse sizes of channels, expanded range of products, lower costs. ^ 7 cl, 6 dwg