| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polymer compound which enables to obtain a highly sensitive photoresist composition which forms a fine pattern with excellent resolution and good rectangular shape and gives good resist characteristics even when the acid generated by an acid generator is weak, a photoresist composition using such a polymer compound, and a method for forming a resist pattern using the photoresist composition. <P>SOLUTION: The polymer compound has alkali-solubility variable by the action of an acid. A hydrogen atom of a phenolic hydroxy group in a constitutional unit represented by at least one of chemical formula (30) or (31) of the polymer compound is substituted with an acid-dissociable dissolution inhibiting group represented by general formula (1) (in formula, R<SB POS="POST">1</SB>is an alicyclic group with the number of carbon atoms of 20 or less, and n is 0 or an integer of 1-5). <P>COPYRIGHT: (C)2012,JPO&INPIT |
