发明名称 |
METHOD FOR CONTROLLING PATTERN UNIFORMITY OF SEMICONDUCTOR DEVICE |
摘要 |
A method for controlling uniformity of patterns formed in a semiconductor device includes obtaining simulation contours with respect to respective cases while controlling a size of an outermost pattern and determining a size of the outermost pattern in which uniform distribution values (3&sgr;) value of patterns included in the simulation contours satisfying specific conditions as a size of target outermost pattern.
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申请公布号 |
US2011276928(A1) |
申请公布日期 |
2011.11.10 |
申请号 |
US20100915570 |
申请日期 |
2010.10.29 |
申请人 |
HYNIX SEMICONDUCTOR INC. |
发明人 |
HAN DUK SUN;KIM MI HYE |
分类号 |
G06F17/50;G03F1/36;G03F1/68;H01L21/027 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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