发明名称 Maskless exposure apparatus and method of alignment for overlay in maskless exposure
摘要 Example embodiments are directed to a maskless exposure device and an alignment method. The alignment method performs an overlay of each layer of a plurality of layers on a substrate using a virtual mask in a maskless exposure technique. The maskless exposure device and the alignment method use a virtual mask instead of a physical mask used in a conventional mask exposure, a virtual target mark instead of an alignment mark used in the conventional mask exposure, and perform an overlay per layer, such that the deposition exposure can be achieved in the maskless exposure.
申请公布号 US2011273690(A1) 申请公布日期 2011.11.10
申请号 US201113064558 申请日期 2011.03.31
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 AHN SUNG MIN;CHOI HO SEOK;JANG SANG DON
分类号 G03B27/54 主分类号 G03B27/54
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