| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a material for forming a protective film which is capable of improving water repellency while suppressing a deterioration in alkali solubility of the protective film, and to provide a forming method for a resist pattern using the material for forming a protective film. <P>SOLUTION: A material for forming a protective film contains an alkali-soluble polymer having a structural unit derived from a monomer represented by formula (A-1). In the formula, R<SP POS="POST">0</SP>represents a group expressed by formula (a-1) or formula (a-2), Q<SP POS="POST">0</SP>represents a divalent linkage group which may have a single bond or a fluorine atom, and R<SP POS="POST">1</SP>represents an organic group which may have a fluorine atom. <P>COPYRIGHT: (C)2012,JPO&INPIT |
