| 发明名称 |
SYSTEMS AND METHODS FOR THIN-FILM DEPOSITION OF METAL OXIDES USING EXCITED NITROGEN-OXYGEN SPECIES |
| 摘要 |
The present invention relates to a process and system for depositing a thin film onto a substrate. One aspect of the invention is depositing a thin film metal oxide layer using atomic layer deposition (ALD).
|
| 申请公布号 |
US2011275166(A1) |
申请公布日期 |
2011.11.10 |
| 申请号 |
US201113102980 |
申请日期 |
2011.05.06 |
| 申请人 |
ASM AMERICA, INC. |
发明人 |
SHERO ERIC J.;RAISANEN PETRI I.;JUNG SUNG-HOON;WANG CHANG-GONG |
| 分类号 |
H01L21/66;C23C16/40;C23C16/50;C23C16/52;H01L21/31 |
主分类号 |
H01L21/66 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
