发明名称 COMPOSITE METAL LAYER WITH SUPPORT METAL FOIL, WIRING BOARD USING THE SAME AND METHOD FOR MANUFACTURING THE SAME, METHOD FOR MANUFACTURING SEMICONDUCTOR PACKAGE USING THE WIRING BOARD
摘要 <P>PROBLEM TO BE SOLVED: To provide a composite metal layer with a support metal foil which reduces wastes to be generated by manufacture of a wiring board and is favorable for the global environment, the wiring board using the same and a method for manufacturing the same, and a method for manufacturing a semiconductor package using the wiring board. <P>SOLUTION: There is provided the composite metal layer with the support metal foil which is constituted by laminating a plurality of metal layers consisting of the bottom layer metal layer which is the support metal foil and two or more layers of metal layers while putting a peeling layer between the adjacent metal layers, in which peeling strength between each metal layer A which is located between the bottom layer metal layer and the top layer metal layer and a metal layer B adjacent to the metal layer A via a peeling layer on its top face is smaller than peeling strength between the metal layer A and a metal layer C adjacent to the metal layer A via a peeling layer on its bottom face, the wiring board using the same and the method for manufacturing the same, the method for manufacturing the semiconductor package using the wiring board. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011228613(A) 申请公布日期 2011.11.10
申请号 JP20100198620 申请日期 2010.09.06
申请人 NIPPON DENKAI LTD;HITACHI CHEM CO LTD 发明人 TANABE KOICHI;YAGIHASHI NOBUCHIKA;TAMURA TADASHI;SUZUKI KUNIJI;TSUBOMATSU YOSHIAKI
分类号 H05K1/09;H01L23/12;H05K3/46 主分类号 H05K1/09
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