发明名称 RESIN COMPOSITION, MULTILAYER STRUCTURE USING THE RESIN COMPOSITION, AND ITS MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a multilayer structure excellent in gas barrier performance even after being applied with hot-water treatment, and to provide a resin composition which can suppress an increase of viscosity at the time of melting and mixing. <P>SOLUTION: The resin composition contains (A) a saponified product of an ethylene-vinylester copolymer, and (B) a complete dehydration product or a partial dehydration product of polyvalent metal hydrosulfate hydrate. It is preferable that the (B) component is a complete dehydration product or a partial dehydration product of divalent metal hydrosulfate hydrate. At the manufacturing of the resin composition, and even at the manufacturing of the multilayer structure, an increase of the viscosity is suppressed, and stable manufacturing is enabled. After being applied with the hot-water treatment, particularly even after retort treatment, the obtained molded product is high in the speed of the recovery of the gas barrier performance, and also the excellent gas barrier performance can be maintained. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011225800(A) 申请公布日期 2011.11.10
申请号 JP20100193783 申请日期 2010.08.31
申请人 NIPPON SYNTHETIC CHEM IND CO LTD:THE 发明人 YOSHIDA TOMONORI;YAMADA KOJI
分类号 C08L29/04;B32B27/28;C08J3/20;C08K3/30;C08K7/00;C08L77/00 主分类号 C08L29/04
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