发明名称 INSPECTION DEVICE AND INSPECTION METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a device and a method to inspect height variations of a sample. <P>SOLUTION: An inspection device comprises: a holder 211 holding a sample 29; a charge control unit 23 which electrically charges the sample 29 held by the holder 211; a retarding power supply 24 which applies a voltage to the sample 29 held by the holder 211; an electron optical system 20 which irradiates an electron beam toward the sample 29 supplied with the voltage from the retarding power supply 24, thereby causing mirror electrons retracted from the vicinity of a surface of the sample 29 to form an image; and an image processing unit 27 which processes a mirror image formed by the mirror electrons. The image processing unit 27 outputs, as height variations of the sample 29, information based on a difference between the mirror image formed by the mirror electrons and a standard mirror image prepared in advance. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011228311(A) 申请公布日期 2011.11.10
申请号 JP20110136946 申请日期 2011.06.21
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 MAKINO HIROSHI;HASEGAWA MASAKI;MARUYAMA MOMOYO
分类号 H01J37/29;G01N23/225;G01Q30/02;G01Q60/24;H01J37/20;H01J37/22;H01J37/28 主分类号 H01J37/29
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