| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method for a multiple gradation mask having high transmittance of exposure light in a translucent part thereof and high in-plane uniformity in exposure light transmittance distribution, with which generation of substrate damage can be reduced at a mask manufacturing stage. <P>SOLUTION: There is provided a manufacturing method for a multiple gradation mask comprising a translucent substrate on which a transfer pattern made up of a light-shielding part, a translucent part and a semitranslucent part which transmits part of exposure light are provided. The manufacturing method comprises: a process of preparing a mask blank with a semitranslucent film made up of a material containing metal and silicon or a material containing one or more metals chosen from metals such as tantalum, and a light-shielding film made up of material containing chrome laminated in this order on the translucent substrate; a process of forming a pattern of the translucent part on the light-shielding film; a process of etching on the semitranslucent film by a substance which is in a non-excitation state and contains a compound made up of fluorine and one element chosen from chlorine, bromine, iodine, and xenon while using the pattern of the translucent part formed on the light-shielding film as a mask; and a process of forming the pattern of the light-shielding part on the light-shielding film. <P>COPYRIGHT: (C)2012,JPO&INPIT |
