| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing liquid with which an aluminum surface used for LSI or the like can be polished smoothly at a high speed and to provide a polishing method of an aluminum film by using the polishing liquid. <P>SOLUTION: The polishing liquid for aluminum film polishing comprises: multivalent carboxylic acid of which the first-stage acid dissociation exponent at 25°C is 3 or less; colloidal silica; and water, where the pH of the polishing liquid is 2 to 4. <P>COPYRIGHT: (C)2012,JPO&INPIT |
