MASK BLANK AND MANUFACTURING METHOD OF IMPRINT MOLD

摘要

PROBLEM TO BE SOLVED: To provide a mask blank which can form a minute mold pattern with high pattern accuracy in manufacturing an imprint mold.

SOLUTION: A mask blank 10 has a translucent substrate 1 and a thin film 2 formed so as to be in contact with a surface of the substrate. The thin film 2 is made of a laminated film including an upper layer 4 made of a material containing Si or a material containing Ta, and a lower layer 3 made of a material containing at least one of Hf and Zr and substantially not containing oxygen.

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