| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive composition which can provide a permanent resist which is excellent in terms of transparency, can also be used as an insulating film of an active matrix substrate and has high heat resistance and chemical resistance after high heat history and to provide a permanent resist using the positive photosensitive composition and a method for manufacturing the permanent resist. <P>SOLUTION: A positive photosensitive composition includes as (A) component polysiloxane compound obtained by hydrolysis and condensation of a predetermined cyclic siloxane compound and a predetermined alkoxysilane compound such that silanol groups remain, as (B) component a compound with at least two epoxy groups, as (C) component diazonaphthoquinones and as (D) component an organic solvent. <P>COPYRIGHT: (C)2012,JPO&INPIT |
