发明名称 ANNEALED NANOSTRUCTURED THIN FILM CATALYST
摘要 This disclosure provides methods of making enhanced activity nanostructured thin film catalyst by radiation annealing, typically laser annealing, typically under inert atmosphere. Typically the inert gas has a residual oxygen level of 100 ppm. Typically the irradiation has an incident energy fluence of at least 30 mJ/mm2?. In some embodiments, the radiation annealing is accomplished by laser annealing. In some embodiments, the nanostructured thin film catalyst is provided on a continuous web.
申请公布号 WO2011139705(A1) 申请公布日期 2011.11.10
申请号 WO2011US33972 申请日期 2011.04.26
申请人 3M INNOVATIVE PROPERTIES COMPANY;DEBE, MARK K.;SMITHSON, ROBERT L. W.;STUDINER, CHARLES J., IV;HENDRICKS, SUSAN M.;KURKOWSKI, MICHAEL J.;STEINBACH, ANDREW J. L. 发明人 DEBE, MARK K.;SMITHSON, ROBERT L. W.;STUDINER, CHARLES J., IV;HENDRICKS, SUSAN M.;KURKOWSKI, MICHAEL J.;STEINBACH, ANDREW J. L.
分类号 H01M4/92;B01J37/34;H01M4/86;H01M4/88;H01M8/10 主分类号 H01M4/92
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