| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent size variation due to proximity effect and loading effect. <P>SOLUTION: A drawing device 100 comprises a storage device 142 for storing a plurality of data sets in which each set is constituted with a proximity effect correction coefficient (η) map and a reference exposure map, an exposure calculation part 50 for reading each data set and calculating an exposure map for each set, a size map creation part 52 for creating a size map using the calculated exposure map for each set, an addition part 54 for adding sizes of all sets for each map position using the size map of each set, a map creation part 12 for creating a set of the η map and the reference exposure map using an added addition size map, an exposure amount calculation part 18 for calculating an exposure map using the created set of the η map and the reference exposure map, and a drawing part 150 for drawing a pattern on a specimen using an electron beam with the exposure amount defined on the exposure map, thereby correcting the size variation. <P>COPYRIGHT: (C)2012,JPO&INPIT |
