发明名称 HIGHER-ORDER SILANE COMPOSITION AND METHOD FOR PRODUCING SUBSTRATE WITH FILM
摘要 A composition containing a high order silane compound and a solvent, wherein the solvent contains a cyclic hydrocarbon which has one or two double bonds and no alkyl group, is composed of only carbon and hydrogen and has a refractive index of 1.40 to 1.51, a specific permittivity of not more than 3.0 and a molecular weight of not more than 180. Method of manufacturing a film-coated substrate using the high order silane composition.
申请公布号 KR20110122666(A) 申请公布日期 2011.11.10
申请号 KR20117015828 申请日期 2010.01.07
申请人 JAPAN SCIENCE AND TECHNOLOGY AGENCY 发明人 SHIMODA TATSUYA;MATSUKI YASUO;MASUDA TAKASHI
分类号 C01B33/04;C01B33/107;C01B33/12;H01L21/208 主分类号 C01B33/04
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