发明名称 |
HIGHER-ORDER SILANE COMPOSITION AND METHOD FOR PRODUCING SUBSTRATE WITH FILM |
摘要 |
A composition containing a high order silane compound and a solvent, wherein the solvent contains a cyclic hydrocarbon which has one or two double bonds and no alkyl group, is composed of only carbon and hydrogen and has a refractive index of 1.40 to 1.51, a specific permittivity of not more than 3.0 and a molecular weight of not more than 180. Method of manufacturing a film-coated substrate using the high order silane composition. |
申请公布号 |
KR20110122666(A) |
申请公布日期 |
2011.11.10 |
申请号 |
KR20117015828 |
申请日期 |
2010.01.07 |
申请人 |
JAPAN SCIENCE AND TECHNOLOGY AGENCY |
发明人 |
SHIMODA TATSUYA;MATSUKI YASUO;MASUDA TAKASHI |
分类号 |
C01B33/04;C01B33/107;C01B33/12;H01L21/208 |
主分类号 |
C01B33/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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