Method for the production of biaxially textured films and films obtained using such a method

摘要

Disclosed is a method for producing a biaxially textured film (10) on a substrate (1) comprising the steps of: i) deposition of a uniaxially textured film (4, 7) on the substrate (1); ii) ion bombardment (3) of the uniaxially textured film (4, 7) with an irradiation angle (±) relative to the normal (12) to the plane of the substrate at the point of irradiation in the range of 10-80° until only nanocrystals having essentially the same out-of-plane and in-plane orientation remain in the film (4, 7) essentially over the full thickness (13) of the film (4, 7); wherein this sequence of steps i) and ii) is repeated until a biaxially textured film (10) which is essentially in-plane continuous is formed. The correspondingly produced biaxially textured films show uniform texture over the full thickness of the film layer and can be used for many applications such as microelectronics applications.