| 摘要 |
<p>A partial section of an aerial image measuring unit is arranged at a wafer stage (WST) and part of the remaining section is arranged at a measurement stage (MST), and the aerial image measuring unit measures an aerial image of a mark formed by a projection optical system (PL). Therefore, for example, when the aerial image measuring unit measures a best focus position of the projection optical system (PL), the measurement can be performed using the position of the wafer stage, at which a partial section of the aerial image measuring unit is arranged, in a direction parallel to an optical axis (AX) of the projection optical system as a datum for the best focus position. Accordingly, when exposing an obj ect (W) with illumination light (IL), the position of the wafer stage (WST) in the direction parallel to the optical axis (AX) is adjusted with high accuracy based on the measurement result of the best focus position.</p> |
