发明名称 Method for inspecting a foreign matter on mirror-finished substrate
摘要 Provided is a foreign matter inspection method for positively detecting a foreign matter in the neighborhood of the edge of a mirror-finished substrate without fail. Edge-emphasis and binarization are performed following the taking of an image of a substrate-under-inspection at a contour of its inspection area, to further detect a plurality of sampling points representative of a contour of the inspection area. An estimated inspection area is determined by determining the size, position and rotation angle of contour lines defined, size-reducibly, from the coordinates of the plurality of sampling points. After applying a mask to the binary image data in an area other than the estimated inspection area, a foreign-matter detection step is performed.
申请公布号 US8055055(B2) 申请公布日期 2011.11.08
申请号 US20060911594 申请日期 2006.04.19
申请人 PANASONIC CORPORATION 发明人 HAMADA TAIZOU;SUENAGA TATSUTOSHI
分类号 G06K9/00 主分类号 G06K9/00
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