发明名称 Pressure reduction process device, pressure reduction process method, and pressure regulation valve
摘要 The object of the present invention is to provide a low pressure processing system having no possibility of leakage at a valve provided in an exhaust passage when the valve is closed, and capable of reducing a load of maintenance work. An exhaust pipe 3 connected to a reaction tube 1 is provided therein with a gate valve 4 for hermetically closing the exhaust passage. A purge gas is jetted, from jetting ports circumferentially arranged respectively in a valve seat and a valving element of the gate valve, into a gap between the valve seat and the valving element. This prevents foreign objects originated from a process gas from adhering to those surfaces of the valve seat and the valving element that face the gap between the valve seat and valving element, improving sealing capability of the gate valve.
申请公布号 US8051870(B2) 申请公布日期 2011.11.08
申请号 US20040563208 申请日期 2004.07.02
申请人 TOKYO ELECTRON LIMITED 发明人 MATSUURA HIROYUKI
分类号 F16K51/02;C23C16/44;F16K25/02;H01L21/31 主分类号 F16K51/02
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