发明名称 |
Resist composition, resin for use in the resist composition, compound for use in the synthesis of the resin, and pattern-forming method using the resist composition |
摘要 |
A resist composition comprises: (A) a resin capable of increasing its solubility in an alkali developer by action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent, wherein the resin (C) has a degree of molecular weight dispersion of 1.3 or less and a weight average molecular weight of 1.0×104 or less.
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申请公布号 |
US8053161(B2) |
申请公布日期 |
2011.11.08 |
申请号 |
US20070860585 |
申请日期 |
2007.09.25 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
WADA KENJI;SAEGUSA HIROSHI |
分类号 |
G03F7/039;C08F14/18;G03F7/075;G03F7/20;G03F7/30 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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