发明名称 |
Method and apparatus for angular-resolved spectroscopic lithography characterization |
摘要 |
An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference. |
申请公布号 |
US8054467(B2) |
申请公布日期 |
2011.11.08 |
申请号 |
US20100805852 |
申请日期 |
2010.08.20 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
DEN BOEF ARIE JEFFREY MARIA;BLEEKER ARNO JAN;VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA;DUSA MIRCEA;KIERS ANTOINE GASTON MARIE;LUEHRMANN PAUL FRANK;PELLEMANS HENRICUS PETRUS MARIA;VAN DER SCHAAR MAURITS;GROUWSTRA CEDRIC DESIRE;VAN KRAAIJ MARKUS GERARDUS MARTINUS |
分类号 |
G01J3/45 |
主分类号 |
G01J3/45 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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