发明名称 Varactor structures
摘要 An improved varactor diode (20, 50) having first (45) and second (44) terminals is obtained by providing a substrate (22, 52) having a first surface (21, 51) in which are formed isolation regions (28, 58) separating first (23, 53) and second (25, 55) parts of the diode (20, 50). A varactor junction (40, 70) is formed in the first part (23, 53) and having a first side (35, 66) coupled to the first terminal (45) and a second side (34, 54) coupled to the second terminal (44) via a sub-isolation buried layer (SIBL) region (26, 56) extending under the bottom (886) and partly up the sides (885) of the isolation regions (28, 58) to a further doped region (30, 32; 60, 62) ohmically connected to the second terminal (44). The first part (36, 66) does not extend to the SIBL region (26, 56). The varactor junction (40, 70) desirably comprises a hyper-abrupt doped region (34, 54). The combination provides improved tuning ratio, operating frequency and breakdown voltage of the varactor diode (20, 50) while still providing adequate Q.
申请公布号 US8053866(B2) 申请公布日期 2011.11.08
申请号 US20090536715 申请日期 2009.08.06
申请人 FREESCALE SEMICONDUCTOR, INC. 发明人 WELCH PAMELA J.;HUANG WEN LING M.;MORGAN DAVID G.;REUDA HERNAN A.;TRIVEDI VISHAL P.
分类号 H01L29/93;H01L21/329 主分类号 H01L29/93
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