| 发明名称 |
Lithographic apparatus and device manufacturing method |
| 摘要 |
A lithographic projection apparatus in which a liquid supply system and the geometry of the objects on the substrate table are arranged to avoid high velocity immersion liquid flowing over sensors.
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| 申请公布号 |
US8054445(B2) |
申请公布日期 |
2011.11.08 |
| 申请号 |
US20060499855 |
申请日期 |
2006.08.07 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
JANSEN HANS;HOOGENDAM CHRISTIAAN ALEXANDER;SENGERS TIMOTHEUS FRANCISCUS;KUIJPER ANTHONIE |
| 分类号 |
G03B27/52 |
主分类号 |
G03B27/52 |
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