发明名称 |
Apparatus and method for providing fluid for immersion lithography |
摘要 |
An apparatus and method are disclosed for providing fluid for immersion lithography. Immersion fluid is injected into an inner cavity in a direction that is different than a direction in which the nozzle moves. The immersion fluid can also be injected at different rates into the inner cavity at different sides. A wafer substrate is then exposed by light through the immersion fluid.
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申请公布号 |
US8054448(B2) |
申请公布日期 |
2011.11.08 |
申请号 |
US20060579442 |
申请日期 |
2006.11.02 |
申请人 |
NIKON CORPORATION |
发明人 |
POON ALEX KA TIM;KHO LEONARD WAI FUNG |
分类号 |
G03B27/42;G03F7/20 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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