发明名称 Method of manufacture of an integrated circuit system with self-aligned isolation structures
摘要 An integrated circuit system is provided including providing a substrate, forming an isolation structure base in the substrate without removal of the substrate, and forming a first transistor in the substrate next to the isolation structure base.
申请公布号 US8053327(B2) 申请公布日期 2011.11.08
申请号 US20060614961 申请日期 2006.12.21
申请人 GLOBALFOUNDRIES SINGAPORE PTE. LTD. 发明人 MISHRA SHAILENDRA;TEO LEE WEE;LEE YONG MENG;LUN ZHAO;LAI CHUNG WOH;TAN SHYUE SENG;CHEE JEFFREY;WIDODO JOHNNY
分类号 H01L21/76;H01L21/00 主分类号 H01L21/76
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