| 摘要 |
PURPOSE: A plasma processing apparatus is provided to process a large number of substrates at once, thereby improving process productivity. CONSTITUTION: A plasma processing apparatus comprises a unit chamber assembly and a unit plasma electrode(200). The unit chamber assembly comprises a first chamber(110) and a second chamber(120). The second chamber is independently arranged in the lower part of the first chamber. A first electrode part generates plasma in the inside of the first chamber. A second electrode part generates plasma in the inside of the second chamber. A bent part connects the first electrode part and second electrode part.
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