发明名称 NANOWIRE MESH DEVICE AND METHOD OF FABRICATING SAME
摘要 <p>A semiconductor structure is provided that includes a plurality of vertically stacked and vertically spaced apart semiconductor nanowires (e.g., a semiconductor nanowire mesh) located on a surface of a substrate. One end segment of each vertically stacked and vertically spaced apart semiconductor nanowires is connected to a source region and another end segment of each vertically stacked and vertically spaced apart semiconductor nanowires is connected to a drain region. A gate region including a gate dielectric and a gate conductor abuts the plurality of vertically stacked and vertically spaced apart semiconductor nanowires, and the source regions and the drain regions are self-aligned with the gate region.</p>
申请公布号 KR20110121630(A) 申请公布日期 2011.11.07
申请号 KR20117021214 申请日期 2009.12.11
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CHANG JOSEPHINE;BEDELL STEPHEN;CHANG PAUL;GUILLORN MICHAEL;SLEIGHT JEFFREY
分类号 H01L29/78;H01L21/336 主分类号 H01L29/78
代理机构 代理人
主权项
地址