发明名称 PHASE CHANGE MEMORY DEVICE AND METHOD OF MANUFACTURING SAME
摘要 <p>PURPOSE: A phase change memory device and a manufacturing method thereof are provided to eliminate heat dispersed to an adjacent memory cell in heating for writing a memory cell by forming a heat absorption layer between memory cells which are placed on the same bit line. CONSTITUTION: A plurality of bit lines(170) is arranged to be crossed with a plurality of word lines(110). A switching element(120) is respectively arranged in the cross point of the bit line and the word line. Heating electrodes are respectively connected to the switching element. A heat absorption layer(150b) is placed between neighboring heating electrodes. A phase change film(165) is formed in the upper part of the heating electrodes and the heat absorption layer.</p>
申请公布号 KR20110121386(A) 申请公布日期 2011.11.07
申请号 KR20100040959 申请日期 2010.04.30
申请人 HYNIX SEMICONDUCTOR INC. 发明人 PARK, NAM KYUN
分类号 H01L27/115;H01L21/8247;H01L27/10 主分类号 H01L27/115
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