发明名称 PROXIMITY EXPOSURE APPARATUS, SUBSTRATE POSITIONING METHOD FOR PROXIMITY EXPOSURE APPARATUS, MANUFACTURING METHOD FOR PANEL SUBSTRATE FOR DISPLAY, AND FINE ANGLE DETECTION METHOD USING OPTICAL DISPLACEMENT METER
摘要 <P>PROBLEM TO BE SOLVED: To carry out positioning of a substrate in direction &theta; with high accuracy by detecting inclination of chucks in the direction &theta; with high accuracy using a plurality of optical displacement meters. <P>SOLUTION: The chucks 10a, 10b are placed on a moving stage which is moved in the direction XY and rotated in the direction &theta;. Displacements of the chucks 10a, 10b are measured in a plurality of positions by a plurality of optical displacement meters (laser displacement meters 42) and measured values of respective optical displacement meters are corrected by correction values which are determined beforehand for every optical displacement meter according to the angle of the moving stage in the direction &theta;. Positioning of the substrate 1 in the direction &theta; is carried out by detecting the inclination of the chucks 10a, 10b from corrected measured values and rotating the chucks 10a, 10b in the direction &theta; by the moving stage according to the detected inclination of the chucks 10a, 10b in the direction &theta;. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011221245(A) 申请公布日期 2011.11.04
申请号 JP20100089660 申请日期 2010.04.08
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 HAYASHI TOMOAKI;SATO RIYUUGO
分类号 G03F7/20;G02F1/13 主分类号 G03F7/20
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