| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an alignment method for precisely aligning each one of shots S1 to S32 a substrate P with a pattern image of a mask M by obtaining an array of the shots S1 to S32 based on the condition of a temperature distribution on upper surface of a first holding section 26 of a substrate table PT. <P>SOLUTION: By determining the number of shots for assigning sample shots from shots S1 to S32, an array of the sample shots, degree of regression analysis used for calculation of a displacement model about a substrate alignment mark PAM based on a temperature distribution on upper surface of a first holding section 26, and by executing EGA processing, the array of the shots S1 to S32 is estimated. Thereafter, a substrate P is exposed sequentially by aligning each of the estimated shots S1 to S32 with a pattern image of a mask M. <P>COPYRIGHT: (C)2012,JPO&INPIT |
