| 摘要 |
<P>PROBLEM TO BE SOLVED: To change exposure according to a temporal sensitivity variation of a resist applied to a work, and to expose the whole exposure region of one turn of a band-like work with a desired exposure accuracy. <P>SOLUTION: A band-like work W unwound from an unwind roll 1 is conveyed to an exposure unit 3 and exposed with exposure light emitted from a light emission unit 4 via a mask M. A control unit 20 is configured to store such a parameter as a decrement amount of an exposure time corresponding to the temporal sensitivity variation of a resist applied to the work and an exposure time of the final exposure region; and the control unit 20 is configured to count the exposure frequency of the band-like work and to set up the exposure time of the exposure region which is subject to exposure based on a count value from the start of exposure and the above-mentioned parameter. Then, the control unit 20 is configured to control an opening time of a shutter board 6a of a shutter mechanism 6 in accordance with the exposure time, and to control each exposure region of the band-like work to be subject to exposure to have the above-mentioned exposure time. <P>COPYRIGHT: (C)2012,JPO&INPIT |
