| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which drops chemical liquid onto the substrate and processes the substrate by rotating the substrate, and reduces suspended mist without disturbing the environment in the substrate processing apparatus, and a coating development system comprising the same. <P>SOLUTION: A substrate processing apparatus is disclosed which drops liquid onto the substrate and processes the substrate by rotating the substrate. The substrate processing apparatus comprises a substrate holding part supporting the back face of the substrate, a substrate rotating part rotating the substrate holding part, a chemical liquid dropping part dropping chemical liquid onto the substrate supported by the substrate holding part, a recessed cup part surrounding the substrate supported by the substrate holding part, a suction port placed between the substrate supported by the substrate holding part and the inner peripheral surface of the cup, and a gas discharging part driven by the substrate rotating part and discharging the gas sucked through the suction port by communicating with the suction port into the lower side of the space of the substrate holding part. <P>COPYRIGHT: (C)2012,JPO&INPIT |
