| 摘要 |
<P>PROBLEM TO BE SOLVED: To detect a defect of a mask early and improve a throughput. <P>SOLUTION: A pattern drawing system includes a pattern drawing device 100 and a pattern inspection device 200 connected with each other. The pattern drawing device 100 detects by an electron detector 120 secondary electrons emitted from a substrate upon drawing, generates defect prediction data in accordance with an obtained drawing result data, and sends the defect prediction data to the pattern inspection device 200 through a LAN 130. The pattern inspection device 200 receives the defect prediction data supplied from the pattern drawing device 100 and determines an order of priority of inspection in accordance with the defect prediction data. <P>COPYRIGHT: (C)2012,JPO&INPIT |
