| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an aberration measurement apparatus and an aberration measurement method with which more accurate detection can be performed. <P>SOLUTION: An aberration measurement apparatus for measuring aberration of an optical system has: a light gathering optical system for forming multiple light spots on a predetermined surface by dividing wave fronts via the optical system and gathering the light; a detecting part which includes an imaging device for detecting the multiple light spots and calculates aberration of the optical system based on the result of detection from the imaging device; and a driving part for performing relative movement of the multiple light spots and an imaging part of the imaging device. The detecting part calculates aberration of the optical system based on the respective detection results from the imaging device before and after the relative movement performed by the driving part. <P>COPYRIGHT: (C)2012,JPO&INPIT |
