发明名称 LASER EXPOSURE DEVICE
摘要 The device is provided with a first fly eye lens (2) to enlarge the cross-sectional shape of a laser beam, a first light path difference adjustment member (3) that is provided on the laser beam incident side of the first fly eye lens (2) and creates phase differences in the laser beam that enters each condenser lens (2a) of the first fly eye lens (2), a condenser lens (4) for transforming the laser beam exiting the light path difference adjustment member (3) into parallel light, a second fly eye lens (6) to produce uniform light intensity distribution by the laser beam in a photomask illumination area, and a second light path difference adjustment member (7) that is provided on the laser beam incident side of the second fly eye lens (6) and creates phase differences in the laser beam that enters each condenser lenses (6a) of the second fly eye lens (6). As a result, interference patterns in the laser beam created by the first fly eye lens are averaged out, and uneven lighting by the laser beam is reduced.
申请公布号 KR20110120872(A) 申请公布日期 2011.11.04
申请号 KR20117016451 申请日期 2010.02.02
申请人 V TECHNOLOGY CO., LTD.;TOPPAN PRINTING CO., LTD. 发明人 TANADA YUJI;ISHII DAISUKE;KAJIYAMA KOICHI;MIZUMURA MICHINOBU;HATANAKA MAKOTO;MATSUI KOHEI;IKEDA TAKESHI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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