| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an absorbable spin-on glass anti-reflection film and lithography material that a) can absorb a light strongly and evenly in a region of ultraviolet light, b) does not "collapse" a resist material or run off an intended resist line, and c) does not react photoresist developer in a manufacturing process of an SOG anti-reflection film to develop manufacture of layered materials, electronic components, and semiconductor components. <P>SOLUTION: Absorbable spin-on glass composition includes at least one inorganic compound, at least one absorbable organic compound that can be introduced, and at least one pH adjuster. <P>COPYRIGHT: (C)2012,JPO&INPIT |
