MASK DRY CLEANING APPARATUS AND MASK DRY CLEANING METHOD, AND APPARATUS FOR MANUFACTURING MASK DRY

摘要

PROBLEM TO BE SOLVED: To provide a mask dry cleaning apparatus and a mask dry cleaning method capable of enhancing the throughput and increasing the number for treatment in a dry cleaning method, and to provide an apparatus for manufacturing mask dry capable of cleaning the mask dry in a short time by providing the mask dry cleaning apparatus adjacent to a vapor deposition apparatus.

SOLUTION: When cleaning a mask by irradiating a vapor deposition material deposited on the mask with laser beam emitted from a laser beam source, the shape of the laser beam is changed from a circular shape to an elliptical shape, and the vapor deposition material deposited on the mask is irradiated with the laser beam of the elliptical shape for cleaning.

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