发明名称 POSITIVE RADIATION-SENSITIVE COMPOSITION, INTERLAYER INSULATING FILM FOR DISPLAY ELEMENT, AND FORMATION METHOD FOR SAME
摘要 <p>Disclosed is a positive radiation-sensitive composition containing: a polymer [A] containing, in the same or different polymer molecules, a structural unit (I) having a group represented by formula (1), and an epoxy group-containing structural unit (II); an acid generator [B]; and at least one nitrogen-containing compound [C] selected from a group comprising nitrogen-containing compounds represented by the formula (2) and nitrogen-containing compounds represented by the formula (3). At least one group selected from a group comprising R6 in formula (2) as well as R9 and R10 in formula (3) is preferably a tert-butyl group, a tert-amyl group, a 1-methylcyclohexyl group, or a 1-ethylcyclohexyl group.</p>
申请公布号 WO2011136074(A1) 申请公布日期 2011.11.03
申请号 WO2011JP59574 申请日期 2011.04.18
申请人 JSR CORPORATION;ICHINOHE DAIGO 发明人 ICHINOHE DAIGO
分类号 G03F7/039;C08G59/44;G03F7/004;H01L21/027 主分类号 G03F7/039
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