METHODS FOR CHEMICAL ETCHING OF SEMICONDUCTOR NANOCRYSTALS

摘要

PURPOSE: A chemical etching method of a semiconductor nanocrystal is provided to induce an anisotropic crystal plane selective etching reaction of the semiconductor nanocrystal by dissolving the semiconductor nanocrystal in a halogenated solvent, thereby controlling the shape and matter properties of the semiconductor nanocrystal. CONSTITUTION: A chemical etching method of a semiconductor nanocrystal is comprised of the following steps. A solution is arranged by dissolving phosphine in a halogenated solvent. The solution is exposed to oxygen. A chemical etching process of a semiconductor nanocrystal is induced by adding a semiconductor nanocrystal in the solution. The semiconductor nanocrystal is made of a hetero structure including one or more compositions.