发明名称 |
MEMS MICROPHONE AND METHOD FOR MANUFACTURING SAME |
摘要 |
The present invention relates to a MEMS microphone having less residual stress at a contact portion between a silicon substrate and a membrane, and to a method for manufacturing the MEMS microphone. The MEMS microphone comprises: a silicon substrate in which a back chamber is formed; a back plate deposited on the silicon substrate and including a plurality of sound holes; a membrane deposited on the silicon substrate and spaced apart from the back plate to form an air gap; and a stress buffer deposited between the membrane and the silicon substrate. |
申请公布号 |
WO2011081288(A3) |
申请公布日期 |
2011.11.03 |
申请号 |
WO2010KR07535 |
申请日期 |
2010.10.29 |
申请人 |
BSE CO., LTD.;KIM, YONG-KOOK |
发明人 |
KIM, YONG-KOOK |
分类号 |
H04R19/00;H04R19/04 |
主分类号 |
H04R19/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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