发明名称 MEMS MICROPHONE AND METHOD FOR MANUFACTURING SAME
摘要 The present invention relates to a MEMS microphone having less residual stress at a contact portion between a silicon substrate and a membrane, and to a method for manufacturing the MEMS microphone. The MEMS microphone comprises: a silicon substrate in which a back chamber is formed; a back plate deposited on the silicon substrate and including a plurality of sound holes; a membrane deposited on the silicon substrate and spaced apart from the back plate to form an air gap; and a stress buffer deposited between the membrane and the silicon substrate.
申请公布号 WO2011081288(A3) 申请公布日期 2011.11.03
申请号 WO2010KR07535 申请日期 2010.10.29
申请人 BSE CO., LTD.;KIM, YONG-KOOK 发明人 KIM, YONG-KOOK
分类号 H04R19/00;H04R19/04 主分类号 H04R19/00
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