| 摘要 |
According to one embodiment, a profile measuring apparatus comprises a profile measuring unit, a position acquiring unit, a profile calculating unit, a deflection detecting unit, and a controlling unit. The profile measuring unit has a projecting unit to project a pattern onto a measured object, and an imaging unit to image the pattern. The position acquiring unit acquires a position of the pattern on the measured object. The profile calculating unit calculates a profile of the measured object, based on image information from the imaging unit and position information from the position acquiring unit. The deflection detecting unit detects deflection of the projecting unit. The controlling unit executes active correction for the profile measuring unit and/or passive correction for the profile calculating unit, based on the deflection of the projecting unit detected by the deflection detecting unit.
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