发明名称 POSITIVE RADIATION-SENSITIVE COMPOSITION, INTERLAYER INSULATING FILM FOR DISPLAY ELEMENT, AND FORMATION METHOD FOR SAME
摘要 <p>Disclosed is a positive radiation-sensitive composition containing: a polymer [A] having, in the same or different polymer molecules, a structural unit (I) containing a group represented by formula (1), and an epoxy group-containing structural unit (II); a siloxane polymer [B]; and a photoacid generator [C]. The siloxane polymer [B] is preferably a hydrolytic condensate of a hydrolytic silane compound represented by formula (2). The mass ratio of the polymer [A] to the total of the polymer [A] and the siloxane polymer [B] is preferably 5 - 95 mass%.</p>
申请公布号 WO2011136073(A1) 申请公布日期 2011.11.03
申请号 WO2011JP59573 申请日期 2011.04.18
申请人 JSR CORPORATION;ICHINOHE DAIGO 发明人 ICHINOHE DAIGO
分类号 G03F7/039;G03F7/075 主分类号 G03F7/039
代理机构 代理人
主权项
地址