发明名称 PROCESSING LIQUID SUPPLY APPARATUS
摘要 PURPOSE: A process liquid supply apparatus is provided to contact the lower end part of a process liquid supply part with the lower part of a container main body, thereby suppressing process liquid residues within the container main body. CONSTITUTION: An outer container part(73) is coaxially installed with respect to an inner container part(53). A cylindrical part(81) is surrounded by a lateral wall part(74) of a handle(72). The upper boundary of the cylindrical part is projected to the inside and inserted between a flange(38). A gear part(83) is welded and projected to the outside of the cylindrical part in the outer circumference of the cylindrical part. The gear part respectively includes a combining surface in one side and the other side along a boundary direction.
申请公布号 KR20110120205(A) 申请公布日期 2011.11.03
申请号 KR20110016967 申请日期 2011.02.25
申请人 TOKYO ELECTRON LIMITED 发明人 NAKASHIMA TSUNENAGA;SHIRAISHI SHUNSUKE;TAKEO. TOSHIHIDE
分类号 H01L21/027;B05C11/10 主分类号 H01L21/027
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